Advanced Ion Removal

advanced-ion-removal

Mit Water provides advanced ion removal systems based on ion exchange resin technology for selective removal of specific ionic contaminants from water and wastewater. These systems are custom-engineered to target particular ions of concern including heavy metals, nitrate, fluoride, arsenic and other regulated contaminants.

Working Principle

Ion exchange is a reversible chemical reaction where ions in solution exchange with ions attached to an insoluble resin matrix. Depending on the target contaminant, the system uses strong or weak acid cation resins, strong or weak base anion resins, or chelating resins with high selectivity for specific metals. The process can be designed as co-flow or counter-current regeneration to optimise chemical consumption and effluent quality.

System Configuration

Each advanced ion removal system includes ion exchange vessels with internal distributors and collectors, chemical regeneration and dosing systems, intermediate storage tanks, and a PLC control panel. Resin selection, vessel sizing and regeneration strategy are determined based on feed water analysis and treated water quality targets. Systems are skid-mounted for ease of installation.

Advanced ion removal systems address specific contaminant removal needs:

  • Heavy metal removal from industrial wastewater (Ni, Cu, Zn, Pb, Cr, Cd, Hg)
  • Nitrate removal from groundwater for drinking water production
  • Fluoride removal from groundwater and mining process water
  • Arsenic removal for municipal and rural water supply
  • Boron removal for irrigation water and semiconductor processes
  • Metal recovery from plating rinse water and process streams

Technical Parameters

Flow Rate0.5 to 100 m3/h per unit
Resin TypesSAC, SBA, WAC, WBA, chelating, selective nitrate/fluoride resins
Vessel MaterialFRP, SS316L, or rubber-lined carbon steel
Removal Efficiency95% to 99.9%, contaminant and resin dependent
RegenerantsHCl, H2SO4, NaOH, NaCl (resin specific)
Control SystemPLC with automatic regeneration sequencing
ConfigurationSingle column, lead-lag, or merry-go-round
Power Supply380V / 50Hz / 3-phase